The following facilities are available in our Group at School of Physical sciences, NISER
Modular Thin Film deposition system: A small UHV chamber with base pressure of ~5x10-7 mbar having 4 pocket e-beam and two port thermal boat facilities. This system is dedicated for metal deposition.
DC sputtering system for oxide film
Field Emission Scanning Electron Microscopy (FESEM): This is dedicated for imaging nano-scale materials. The energy dispersive spectroscopy (EDS) option is also available for elemental analysis of nano / microstructures
Plasma enhanced Chemical Vapor Deposition furnace. This is a tube based PECVD, vacuum upto ~1x10-6 mbar can be achieved, 4 gas mixture facilities attached
Mask aligner for photolithography and nano-imprint lithography
Photoliminescence and Electroluminscence setup. Measurment can be dome from RT to LN2 temperature